New silicon-rich silylating reagents for dry-developed positive-tone deep-ultraviolet lithography.
| Autor: | Wheeler, David R., Hutton, Skip, Stein, Susan, Baiocchi, Frank, Cheng, May, Taylor, Gary |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 6, p2789-2793, 5p |
| Databáze: | Complementary Index |
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