Nature and origin of residual impurities in high-purity GaAs and InP grown by chemical beam epitaxy.

Autor: Roth, A. P., Sudersena Rao, T., Benzaquen, R., Lacelle, C., Rolfe, S.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1993, Vol. 11 Issue 3, p836-839, 4p
Databáze: Complementary Index