Characterization of chemically amplified resists for soft x-ray projection lithography.
| Autor: | Kubiak, Glenn D., Kneedler, Eric M., Hwang, Robert Q., Schulberg, Michelle T., Berger, Kurt W., Bjorkholm, J. E., Mansfield, W. M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 6, p2593-2599, 7p |
| Databáze: | Complementary Index |
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