Ion projector wafer exposure results at 5× ion-optical reduction obtained with nickel and silicon stencil masks.
| Autor: | Stengl, G., Bösch, G., Chalupka, A., Fegerl, J., Fischer, R., Lammer, G., Löschner, H., Malek, L., Nowak, R., Traher, C., Wolf, P., Mauger, P., Shimkunas, A., Sen, S., Wolfe, J. C. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 6, p2824-2828, 5p |
| Databáze: | Complementary Index |
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