Resist etching kinetics and pattern transfer in a helicon plasma.

Autor:	Jurgensen, C. W., Hutton, R. S., Taylor, G. N.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 6, p2542-2547, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu