Microscopic uniformity in plasma etching.
Autor: | Gottscho, Richard A., Jurgensen, C. W., Vitkavage, D. J. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 5, p2133-2147, 15p |
Databáze: | Complementary Index |
Externí odkaz: |