Microscopic uniformity in plasma etching.

Autor: Gottscho, Richard A., Jurgensen, C. W., Vitkavage, D. J.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 5, p2133-2147, 15p
Databáze: Complementary Index