Closed-ampoule diffusion of sulfur into Cd-doped InP substrates: Dependence of S profiles on diffusion temperature and time.

Autor: Faur, Mircea, Faur, Maria, Honecy, Frank, Goradia, Chandra, Goradia, Manju, Jayne, Douglas, Clark, Ralph
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 4, p1277-1284, 8p
Databáze: Complementary Index