Silicidation using electron cyclotron resonance plasma.
| Autor: | Nagase, M., Ishii, H., Machida, K., Akiya, H. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 3, p1087-1090, 4p |
| Databáze: | Complementary Index |
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