Soft x-ray projection lithography using a 1:1 ring field optical system.
| Autor: | MacDowell, A. A., Bjorkholm, J. E., Bokor, J., Eichner, L., Freeman, R. R., Mansfield, W. M., Pastalan, J., Szeto, L. H., Tennant, D. M., Wood, O. R., Jewell, T. E., Waskiewicz, W. K., White, D. L., Windt, D. L., Silfvast, W. T., Zernike, F. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3193-3197, 5p |
| Databáze: | Complementary Index |
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