Process characteristics of an all-organic chemically amplified deep-ultraviolet resist.

Autor:	Cheng, M., Nalamasu, O., Timko, A. G., Pol, V., Kometani, J. M., Reichmanis, E., Thompson, L. F.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3374-3379, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu