Electron cyclotron resonance plasma preparation of GaAs substrates for molecular beam epitaxy.

Autor: Choquette, Kent D., Hong, M., Freund, Robert S., Mannaerts, J. P., Wetzel, Robert C.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3502-3505, 4p
Databáze: Complementary Index