Electron cyclotron resonance plasma preparation of GaAs substrates for molecular beam epitaxy.
Autor: | Choquette, Kent D., Hong, M., Freund, Robert S., Mannaerts, J. P., Wetzel, Robert C. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3502-3505, 4p |
Databáze: | Complementary Index |
Externí odkaz: |