Alignment and registration schemes for projection electron lithography.

Autor:	Farrow, R. C., Berger, S. D., Gibson, J. M., Liddle, J. A., Kraus, J. S., Camarda, R. M., Huggins, H. A.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1991, Vol. 9 Issue 6, p3582-3585, 4p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu