Target surface oxide layer formed by reactive sputtering of Ti target in Ar+O2 mixed gas.
| Autor: | Abe, Yoshio, Takamura, Kenji, Kawamura, Midori, Sasaki, Katsutaka |
|---|---|
| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2005, Vol. 23 Issue 5, p1371-1374, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|