Atomic layer deposition of Al2O3 thin films using dimethylaluminum isopropoxide and water.
| Autor: | Cho, Wontae, Sung, Kiwhan, An, Ki-Seok, Sook Lee, Sun, Chung, Taek-Mo, Kim, Yunsoo |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2003, Vol. 21 Issue 4, p1366-1370, 5p |
| Databáze: | Complementary Index |
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