Low-temperature Ar/N2 remote plasma nitridation of SiO2 thin films.
| Autor: | Khandelwal, Amit, Niimi, Hiro, Lucovsky, Gerald, Lamb, H. Henry |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2002, Vol. 20 Issue 6, p1989-1996, 8p |
| Databáze: | Complementary Index |
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