Abnormal room-temperature oxidation of silicon in the presence of copper.

Autor: Hinode, Kenji, Takeda, Ken'ichi, Kondo, Seiichi
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2002, Vol. 20 Issue 5, p1653-1658, 6p
Databáze: Complementary Index