Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor.

Autor: Ullal, Saurabh J., Godfrey, Anna R., Edelberg, Erik, Braly, Linda, Vahedi, Vahid, Aydil, Eray S.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2002, Vol. 20 Issue 1, p43-52, 10p
Databáze: Complementary Index