Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor.
Autor: | Ullal, Saurabh J., Godfrey, Anna R., Edelberg, Erik, Braly, Linda, Vahedi, Vahid, Aydil, Eray S. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2002, Vol. 20 Issue 1, p43-52, 10p |
Databáze: | Complementary Index |
Externí odkaz: |