Optimization of in situ substrate surface treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics.

Autor:	Schönjahn, C., Ehiasarian, A. P., Lewis, D. B., New, R., Münz, W.-D., Twesten, R. D., Petrov, I.
Zdroj:	Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2001, Vol. 19 Issue 4, p1415-1420, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu