Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes.
| Autor: | Kearns, D. M., Gillen, D. R., Voulot, D., McCullough, R. W., Thompson, W. R., Cosimini, G. J., Nelson, E., Chow, P. P., Klaassen, J. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2001, Vol. 19 Issue 3, p993-997, 5p |
| Databáze: | Complementary Index |
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