X-ray photoelectron spectroscopy and Auger electron spectroscopy investigation on the oxidation resistance of plasma-treated copper leadframes.
| Autor: | Wong, A. S. W., Krishnan, R. Gopal, Sarkar, G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2000, Vol. 18 Issue 4, p1619-1631, 13p |
| Databáze: | Complementary Index |
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