Using a quartz crystal microbalance for low energy ion beam etching studies.
| Autor: | Doemling, M. F., Lin, B., Rueger, N. R., Oehrlein, G. S., Haring, R. A., Lee, Y. H. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2000, Vol. 18 Issue 1, p232-236, 5p |
| Databáze: | Complementary Index |
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