Silicon etching in NF3/O2 remote microwave plasmas.
| Autor: | Matsuo, P. J., Kastenmeier, B. E. E., Oehrlein, G. S., Langan, J. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 5, p2431-2437, 7p |
| Databáze: | Complementary Index |
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