Formation of large positive silicon-cluster ions in a remote silane plasma.
| Autor: | Kessels, W. M. M., Leewis, C. M., Leroux, A., van de Sanden, M. C. M., Schram, D. C. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 4, p1531-1535, 5p |
| Databáze: | Complementary Index |
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