Dislocation network developed in titanium nitride by ion implantation.

Autor: Perry, Anthony J., Sharkeev, Yuri P., Geist, Daniel E., Fortuna, Sergey V.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 4, p1848-1853, 6p
Databáze: Complementary Index