Dislocation network developed in titanium nitride by ion implantation.
Autor: | Perry, Anthony J., Sharkeev, Yuri P., Geist, Daniel E., Fortuna, Sergey V. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 4, p1848-1853, 6p |
Databáze: | Complementary Index |
Externí odkaz: |