Low-temperature plasma deposition of dielectric coatings from organosilicon precursors.

Autor:	Lin, C.-T., Li, F., Mantei, T. D.
Zdroj:	Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1999, Vol. 17 Issue 3, p735-740, 6p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu