Use of 2H-heptafluoropropane, 1-iodoheptafluoropropane, and 2-iodoheptafluoropropane for a high aspect ratio via etch in a high density plasma etch tool.
| Autor: | Karecki, Simon, Pruette, Laura, Reif, Rafael, Beu, Laurie, Sparks, Terry, Vartanian, Victor |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1998, Vol. 16 Issue 4, p2722-2724, 3p |
| Databáze: | Complementary Index |
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