Plasma etching of dielectric films with novel iodofluorocarbon chemistries: Iodotrifluoroethylene and 1-iodoheptafluoropropane.
| Autor: | Karecki, S. M., Pruette, L. C., Reif, R. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1998, Vol. 16 Issue 2, p755-758, 4p |
| Databáze: | Complementary Index |
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