Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe.
| Autor: | Collison, Wenli Z., Ni, Tom Q., Barnes, Michael S. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1998, Vol. 16 Issue 1, p100-107, 8p |
| Databáze: | Complementary Index |
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