Plasma nitriding combined with a hollow cathode discharge sputtering at high pressures.
| Autor: | Benda, M., Vlcˇek, J., Cibulka, V., Musil, J. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 5, p2636-2643, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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