Chemical vapor deposition of diamond films on hydrofluoric acid etched silicon substrates.
| Autor: | Schelz, S., Borges, C. F. M., Martinu, L., Moisan, M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 5, p2743-2749, 7p |
| Databáze: | Complementary Index |
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