Growth of very low temperature polysilicon film by remote plasma-enhanced chemical-vapor deposition.
| Autor: | Oh, Jin-Ho, Park, Chong-Yun, Cho, Nam-Ihn, Nam, Hyoung Gin |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 4, p1819-1823, 5p |
| Databáze: | Complementary Index |
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