Effects of oxygen ion assist at 1-10 eV on growth of Bi2(Sr,Ca)2CuOx films at 540 °C by ion-beam sputtering.
| Autor: | Endo, T., Yan, H., Abe, K., Nagase, S., Ishida, Y., Nishiku, H. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 4, p1990-1998, 9p |
| Databáze: | Complementary Index |
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