Comparison of dry etch chemistries for SiC.
| Autor: | McDaniel, G., Lee, J. W., Lambers, E. S., Pearton, S. J., Holloway, P. H., Ren, F., Grow, J. M., Bhaskaran, M., Wilson, R. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1997, Vol. 15 Issue 3, p885-889, 5p |
| Databáze: | Complementary Index |
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