Characterization of as-grown and annealed thin SiO2 films formed in 0.1 M HCl.

Autor: Allegretto, E. M., Bardwell, J. A.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 4, p2437-2442, 6p
Databáze: Complementary Index