Characterization of as-grown and annealed thin SiO2 films formed in 0.1 M HCl.
Autor: | Allegretto, E. M., Bardwell, J. A. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 4, p2437-2442, 6p |
Databáze: | Complementary Index |
Externí odkaz: |