Electron-beam controlled radio frequency discharges for plasma processing.
| Autor: | Kushner, Mark J., Collison, Wenli Z., Ruzic, David N. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 4, p2094-2101, 8p |
| Databáze: | Complementary Index |
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