Contribution of short lifetime radicals to the growth of particles in SiH4 high frequency discharges and the effects of particles on deposited films.
| Autor: | Watanabe, Yukio, Shiratani, Masaharu, Fukuzawa, Tsuyoshi, Kawasaki, Hiroharu, Ueda, Yoshio, Singh, Sanjay, Ohkura, Hiroshi |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 3, p995-1001, 7p |
| Databáze: | Complementary Index |
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