Investigation of multipolar electron cyclotron resonance plasma source sensors and models for plasma control.

Autor:	Mak, P., Tsai, M.-H., Natarajan, J., Wright, B. L., Grotjohn, T. A., Salam, F. M. A., Siegel, M., Asmussen, J.
Zdroj:	Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 3, p1894-1900, 7p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu