Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors.
| Autor: | Hoffman, David M., Prakash Rangarajan, Sri, Athavale, Satish D., Economou, Demetre J., Liu, Jia-Rui, Zheng, Zongshuang, Chu, Wei-Kan |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1996, Vol. 14 Issue 2, p306-311, 6p |
| Databáze: | Complementary Index |
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