Thermal desorption spectroscopic analysis for residual chlorine on Al-Si-Cu after Cl2 electron cyclotron resonance plasma etching.
| Autor: | Teraoka, Yuden, Aoki, Hidemitsu, Nishiyama, Iwao, Ikawa, Eiji, Kikkawa, Takamaro |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 6, p2935-2938, 4p |
| Databáze: | Complementary Index |
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