Characterization of substrate temperature and damage in diamond growth plasmas by multichannel spectroellipsometry.
| Autor: | Wakagi, M., Hong, Byungyou, Nguyen, Hien V., Collins, R. W., Drawl, W., Messier, R. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 4, p1917-1923, 7p |
| Databáze: | Complementary Index |
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