Adsorption and decomposition of diethylsilane and diethylgermane on Si(100): Surface reactions for an atomic layer epitaxial approach to column IV epitaxy.

Autor:	Kellerman, B. K., Mahajan, A., Russell, N. M., Ekerdt, J. G., Banerjee, S. K., Tasch, A. F., Campion, A., White, J. M., Bonser, D. J.
Zdroj:	Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 4, p1819-1825, 7p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu