Dry etching of titanium nitride thin films in CF4-O2 plasmas.
| Autor: | Fracassi, F., d'Agostino, R., Lamendola, R., Mangieri, I. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 2, p335-342, 8p |
| Databáze: | Complementary Index |
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