Thermal relaxation kinetics of strained Si/Si1-xGex heterostructures determined by direct measurement of mosaicity and lattice parameter variations.

Autor: Sardela, M. R., Hansson, G. V.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1995, Vol. 13 Issue 2, p314-326, 13p
Databáze: Complementary Index