Photoemission study of Au, Ge, and O2 deposition on NH4F etched Si(111).
| Autor: | Terry, J., Cao, R., Wigren, C., Pianetta, P. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1994, Vol. 12 Issue 4, p1869-1875, 7p |
| Databáze: | Complementary Index |
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