Photoelectron spectroscopy studies of Tm silicide films on Si(111).
Autor: | Wigren, C., Andersen, J. N., Nyholm, R., Karlsson, U. O. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1993, Vol. 11 Issue 5, p2665-2671, 7p |
Databáze: | Complementary Index |
Externí odkaz: |