Photoelectron spectroscopy studies of Tm silicide films on Si(111).

Autor: Wigren, C., Andersen, J. N., Nyholm, R., Karlsson, U. O.
Zdroj: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1993, Vol. 11 Issue 5, p2665-2671, 7p
Databáze: Complementary Index