Radio-frequency reactive sputter etching in magnetron fields.
Autor: | Davies, K. E., Gross, M., Horwitz, C. M. |
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Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1993, Vol. 11 Issue 5, p2752-2757, 6p |
Databáze: | Complementary Index |
Externí odkaz: |