Etching of silicon in low-pressure plasmas containing fluorine and oxygen: A comparison of real-time and postplasma surface studies.
| Autor: | Oehrlein, Gottlieb S., Kroesen, Gerrit M. W., Lindström, J. Lennart |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1992, Vol. 10 Issue 5, p3092-3099, 8p |
| Databáze: | Complementary Index |
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