Analysis of ion scattering by thin SiO2 layers in boron implants through SiO2 into silicon.
| Autor: | Park, Changhae, Klein, Kevin M., Yang, Shyh-Horng, Tasch, Al F., Simonton, Robert B., Lux, Gayle E. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1992, Vol. 10 Issue 4, p1690-1695, 6p |
| Databáze: | Complementary Index |
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