A molecular beam investigation on activated dissociative adsorption of CH4 and N2 on Ni surface.
| Autor: | Xi, Guangkang, Wang, Jinhe, Li, Shenglin, Shao, Shumin |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1991, Vol. 9 Issue 3, p1688-1692, 5p |
| Databáze: | Complementary Index |
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