Electromigration lifetime and crystal structure of thin aluminum film connectors for microelectronic devices deposited by the ionized cluster beam technique.
| Autor: | Hummel, R. E., Morrone, A., Lambers, E. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 1990, Vol. 8 Issue 3, p1437-1442, 6p |
| Databáze: | Complementary Index |
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